China's Ambitious Plans for EUV Lithography Machines
China is reportedly working on the development of advanced extreme ultraviolet (EUV) lithography machines, with aspirations to begin mass production by 2026. This development could signify a significant leap for the nation in semiconductor technology, traditionally dominated by the Dutch company ASML, the only manufacturer currently capable of producing EUV systems on a commercial scale.
The prospect of China entering the EUV lithography market comes amidst ongoing export restrictions that prevent ASML from selling these sophisticated machines to Chinese semiconductor manufacturers, such as Semiconductor Manufacturing International Corporation (SMIC). Currently, SMIC is limited to producing chips with 7-nanometer technology, primarily for clients like Huawei, relying on older deep ultraviolet (DUV) lithography methods that require multiple exposure processes to achieve finer structures. These methods are not only less efficient but also increase the potential for errors in chip production.
A recent image circulating on social media platforms like TikTok and X features a Chinese machine labeled with 'EUV,' leading many to speculate that China is on the verge of producing chips using this cutting-edge lithography technique. However, experts are cautious about these claims, noting that the machine in question may not be an actual EUV lithography system but rather a tool for aligning and testing silicon wafers, which is essential for the manufacturing process but does not directly involve lithography.
Further examination of the machine reveals additional text that translates to 'EUV lithography objective alignment and interferometer,' indicating its role in the production chain rather than its capability to expose chip designs. This aspect raises doubts about the actual progress of China's EUV technology, as the dimensions of the Chinese machine appear to be significantly smaller than those of ASML's systems.
While rumors suggest that China aims to kickstart its pilot production of EUV machines in summer 2025, credible sources confirming that SMIC or other Chinese companies will be able to manufacture EUV chips in the near term are lacking. The landscape of China's semiconductor industry has been rife with misinformation, particularly concerning its advancements in lithography technology. For example, claims emerged last fall regarding China's self-developed DUV systems capable of producing chips with 8-nanometer technology based on misinterpretations of state documents.
Currently, the only viable EUV lithography process involves exposing chip structures using light with a wavelength of 13.5 nanometers, a crucial requirement for modern chip manufacturing. Without access to EUV systems, companies like SMIC face significant challenges in advancing their technology to compete with global leaders.
As the race for semiconductor supremacy continues, the world watches closely to see whether China's ambitions in the EUV lithography domain will materialize or remain a distant goal.